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Field
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crystals using either electron or X-ray diffraction techniques. While candidates with experience in structure analysis based on powder diffraction, neutron diffraction, or scattering data will also be
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their structural and optical characterization by using atomic force microscopy (AFM), scanning electron microscopy (SEM), x-ray diffraction (XRD), and photoluminescence spectroscopy (PL). The research will be
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spectrometry, X-ray diffraction, X-ray photoelectron spectroscopy, vibrational spectroscopy, and electron microscopy. Documented experience in photophysical characterization, including UV–Vis absorption
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characterise new phosphines and their nickel complexes, using Schlenk techniques, the glovebox, NMR spectroscopy, mass spectrometry, single-crystal X-ray diffraction and other techniques that might be deemed
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with molecular beam epitaxy (MBE). Experience with magneto-optic Kerr effect (MOKE), Hall effect measurements, SQUID magnetometry, X-ray diffraction (XRD), AFM, or related characterization techniques
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disciplines: - Shock physics, - Phase transition mechanisms, - Materials science. They must also be proficient in one or more of the following techniques: - X-ray diffraction, - Velocimetry, - Thermomechanical
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, additional material characterisation with techniques such as X-ray diffraction, X-ray and neutron reflectometry and X-ray photoemesion spectroscopy will be used to provide a fundamental understanding of the
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materials characterization including x-ray diffraction, atomic force microscopy and transmission electron microscopy. Furthermore, you will have access to extensive device fabrication capabilities, and a
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synthesised in situ using a state-of-the-art pulsed laser deposition system. Key characterisations include X-ray diffraction for structural properties and temperature-dependent magneto-optical properties
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to interact with people at all levels both within and outside the laboratory. Preferred Knowledge, Skills, and Experience Experience with X-ray scattering/diffraction and quantitative data analysis and modeling