318 application-forms-"https:"-"https:"-"https:"-"NOVA.id" positions at Oak Ridge National Laboratory
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. Our team is made up of over 7,000 dedicated and innovative individuals! Our goal is to create an environment where a variety of perspectives and backgrounds are valued, ensuring ORNL is known as a top
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Requisition Id 15716 Overview: We are seeking a Postdoctoral Research Associate - Meteorologist who will focus on the development, testing, and deployment of data analysis methods for a variety of
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networked systems. It develops community applications, data assets, and technologies and provides assurance to build knowledge and impact in novel, crosscut-science outcomes. The position is supported by
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expected to contribute to the development and application of advanced manufacturing simulations, and machine learning (ML) models relevant to additive manufacturing, virtual manufacturing, material
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occasional remote contractors which help to support the group and overall NCCS mission. Strategically advance technical professional subject matter expertise for a variety of technical projects, programs
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manufacturing of polymer composites for industrially relevant applications Lead research in composite joining technologies, with emphasis on ultrasonic welding and advanced joining methods Support scale-up
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team is made up of over 7,000 dedicated and innovative individuals! Our goal is to create an environment where a variety of perspectives and backgrounds are valued, ensuring ORNL is known as a top choice
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the world-leading capabilities of ORNL to deliver groundbreaking advancements with a variety of applications, from national security to life-saving medical treatments. ESED is the national steward
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Requirements: This position requires the ability to obtain and maintain an HSPD-12 PIV badge. For employment at Oak Ridge National Laboratory (ORNL), a Real ID compliant form of identification will be required
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polymerization, as well as macromolecular characterization. Nanofabrication Research Laboratory — Develops methods to fabricate nanostructures using best-in-class lithographic, etching, thin-film deposition, and