355 web-developer "https:" "https:" "https:" "Fraunhofer Gesellschaft" positions at NIST
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in various laser-based metal additive manufacturing. The field is plagued by manufacturing errors from this uncertainty. We are looking to develop an atom-based sensor for real-time intensity
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, economics, and all branches of science. Current concerns include the development and analysis of algorithms for the solution of problems of estimation, simulation and control of complex systems, and their
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viability in scaffolds as a quality attribute of a tissue engineered medical product. We will develop new methods for assessing cell viability in scaffolds that have advantages such as being label-free, non
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@nist.gov 301.975.5656 Description The Nanomaterials Research Group is interested in developing analytical methods to foster improved design of nanoparticle-based therapeutics. The design principles
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Description Euv lithography has become a primary manufacturing tool for the semiconductor industry, but new challenges in the development and characterization of EUV resists have emerged as the technology
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approval, we seek to develop methods to measure local stress states in benchmark constriction-flow geometries that lead to blood damage. For example, we seek improvements in flow-field imaging, flow
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the integration of thermodynamic and transport properties and phase equilibria in new ways (e.g., by relating mixture viscosities to azeotropy and liquid-liquid equilibria). The goal is to develop modeling
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Microscopic and Spectroscopic Characterization in Engineered Polymeric Materials NIST only participates in the February and August reviews. The purpose of this research is to develop advanced
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magnetometer, a high-field (7-T) superconducting quantum interference device magnetometer, a magnetic force microscope, Lorentz microscopy, and a newly developed magneto-optical indicator film apparatus
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NIST only participates in the February and August reviews. This research opportunity focuses on developing and improving the state-of-the-art methods for analysis, modeling, and simulation