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@nist.gov 301.975.5656 Description The Nanomaterials Research Group is interested in developing analytical methods to foster improved design of nanoparticle-based therapeutics. The design principles
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Description Euv lithography has become a primary manufacturing tool for the semiconductor industry, but new challenges in the development and characterization of EUV resists have emerged as the technology
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approval, we seek to develop methods to measure local stress states in benchmark constriction-flow geometries that lead to blood damage. For example, we seek improvements in flow-field imaging, flow
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the integration of thermodynamic and transport properties and phase equilibria in new ways (e.g., by relating mixture viscosities to azeotropy and liquid-liquid equilibria). The goal is to develop modeling
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301 975 4364 Kathryn L. Beers kathryn.beers@nist.gov 202 578 8353 Aaron A Burkey aaron.burkey@nist.gov 301.975.4769 Sara Orski sara.orski@nist.gov 301 975 4671 Description Development of quantitative
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crystallography and spectroscopy are fundamental and imperative in the investigation and development of condensed matter sciences. We will widely use these methods to study the crystal structures of novel materials
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materials, (2) the preferred binding sites of adsorbate species in nanoporous solids and predicted experimental signals (e.g., infrared spectra), and (3) the development of DFT-based force field models
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information. Our group performs research and development to extend the accuracy, wavelength range, power range, robustness, and portability of radiometric standards. We use advanced nanfabrication techniques
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system. However, not much is known about how these chemical modifications affect structure-function relationships. We propose to develop robust computational modeling in conjunction with experimental NMR
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within the Radioactivity Group at NIST addresses some of these hurdles in an effort to provide the foundations for absolute quantitation in imaging. NIST pioneered the development of long-lived calibration