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Applications must be exclusively submitted on the admissions platform of the Instituto Superior Técnico at https://fenix.tecnico.ulisboa.pt/fenixedu-admissions and requires registration and validation
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applicants for postdoctoral fellowships to investigate topologically protected synthetic matter in 1D and 2D arrays of semiconductor-superconductor Josephson junctions formed in a variety of lattices. The
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calculated as: NFE = (NF × 0.8) + (ENT × 0.2) . Note: Candidates holding foreign academic qualifications who do not present proof of recognition and grade conversion to the Portuguese scale at the application
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Associação do Instituto Superior Técnico para a Investigação e Desenvolvimento _IST-ID | Portugal | about 11 hours ago
of the following documents: i) B1 Form – Fellowship application (https://ist-id.pt/recursos-humanos/bolseiros/#documentos-relacionados ); ii) Curriculum Vitae; iii) academic degree certificate, where applicable; iv
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to enclose documentation specified in the application form No. 5 – Application form for the election in the associate title of a postdoctoral research fellow and the position of a postdoctoral research fellow
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specified in the application form No. 5 – Application form for the election in the associate title of a postdoctoral research fellow and the position of a postdoctoral research fellow available
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: Monthly maintenance stipend of €1.090,98, according to the FCT Regulation for Studentships and Fellowships (https://www.fct.pt/wp-content/uploads/2026/03/Tabela-de-Valores-SMM-2026.pdf ) plus, if applicable
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) third-country nationals; (c) Stateless persons; d) Beneficiaries of political refugee status. . Application | Formalization of documentary s: Applications must be submitted through the link https
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submit their application from April 16, 2026. until April 30, 2026. (until 5 pm, Lisbon time). Applications are formalized by completing the Application Form https://hr-ucpporto.inqueritos.porto.ucp.pt
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scholars by providing opportunities to research, organize, and collaborate in a highly interdisciplinary environment. Strong applicants will demonstrate evidence of the sort of outstanding scholarly