Sort by
Refine Your Search
-
RAP opportunity at National Institute of Standards and Technology NIST Medical and Industrial Radiation Research Location Physical Measurement Laboratory, Radiation Physics Division opportunity
-
RAP opportunity at National Institute of Standards and Technology NIST Digital Twin of Breath Devices for Forensics and Health Metrology Location Material Measurement Laboratory, Applied
-
RAP opportunity at National Institute of Standards and Technology NIST Algorithms for Compound Identification by Mass Spectrometry Location Material Measurement Laboratory, Biomolecular
-
Causal Green’s Function for Modeling of Phonon Transport in Nanoscale Semiconductors: Application to Devices for Thermal Management and Energy Applications NIST only participates in the February and August reviews. Efficient thermoelectric and thermal management devices consist of complex...
-
RAP opportunity at National Institute of Standards and Technology NIST Mechanisms and Kinetics of Membrane Protein Crystallization in Self-Assembled Mesophases Location NIST Center for Neutron
-
RAP opportunity at National Institute of Standards and Technology NIST Generating Ontologies from Domain Corpora using Artificial Intelligence Techniques Location Information Technology
-
Microstructure of Structural and Functional Ceramics for Additive Manufacturing, Energy Conversion and Storage NIST only participates in the February and August reviews. Control of microstructure, internal dynamics, materials physics and chemistry is of primary importance in determining the...
-
RAP opportunity at National Institute of Standards and Technology NIST Mathematical Models for Characterizing Pluripotent Stem Cell Populations Location Material Measurement Laboratory
-
RAP opportunity at National Institute of Standards and Technology NIST Laser-Matter Interactions in Extreme Ultraviolet Atom Probe Tomography Location Physical Measurement Laboratory, Applied
-
RAP opportunity at National Institute of Standards and Technology NIST CHIPPING away towards accurate properties of semiconductor process gases. Location Material Measurement Laboratory, Applied