1,876 developer-"https:" "https:" "https:" "Fraunhofer Gesellschaft" positions in Germany
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The Fraunhofer-Gesellschaft plays a central role in the innovation process by focusing on key technologies of relevance to the future and on the utilization of the results in business and industry
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digitization. More than 400 employees – including around 100 students – from over 50 countries work at nine locations in scientific and non-scientific teams on the development of innovative methods to accelerate
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»Production Metrology« , we deal with optical metrology systems in the context of production metrology. This includes modification and sensor fusion based on commercial sensing equipment, development of new
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at the Fraunhofer ILT works closely with partners from industry and research on the development of process and system technology for laser metal deposition. The EHLA process (extreme high-speed laser
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pharmacological research. Among these approaches, MINFLUX represents a particularly powerful recent development. MINFLUX is a revolutionary microscopy technique that enables unprecedented optical and temporal
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development, version control systems, Linux environments, and SSH. Very good command of written and spoken English (at least B2 level according to the CEFR: https://go.fzj.de/languagerequirements ), ideally
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for the future. The Fraunhofer-Gesellschaft has established eight research and innovation centers in Heilbronn, including one focused on cybersecurity. This center is a new location of the Fraunhofer Institute
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development. The Competence Center "3D Printing Technology" researches and develops software solutions in the field of graphical 3D printing and multi-material 3D printing. A core element of our work is the 3D
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” group, we work on digitizing building data and making it usable for automated applications and optimizations. To this end, we have developed a web app that uses an AI-based pipeline (computer vision, LLMs
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cell has already achieved a record efficiency of 68.9%. (https://doi.org/10.1002/pssr.202100113) . The thin-film processing of such III-V devices is a crucial building block for maximum efficiency, as it