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. This includes research on the optimal lithography process. Here, piecewise interference lithography will be investigated, the so called SMILE-process (Stepped Mask Interference Lithography Exposure). Objectives
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instruments. Research Objectives: Design of an experimental setup for assessment of the ablative products Development of a suitable diagnostics suite based on in-house available experimental methods Compilation
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arisen, which are to be addressed as part of the project in order to improve methodology. Research Objectives: Based on the given developed methodology, closing knowledge gaps with a special focus on an
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