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. This includes research on the optimal lithography process. Here, piecewise interference lithography will be investigated, the so called SMILE-process (Stepped Mask Interference Lithography Exposure). Objectives
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optimization. In this context, interdisciplinary research is strongly encouraged—particularly collaborations spanning computer science, computational linguistics, cognitive science, and the learning sciences
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researchers, it is a globally respected institution that also has outstanding economic significance for the Rhine-Neckar metropolitan region. Research Assistant/PhD Position – Computer Architecture (f/m/d
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applications. The successful candidate will contribute to establishing and advancing the joint ALD laboratory, including the development of ALD rectors and process optimization for nitride based semiconducting