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sent to tarmo.kadak@taltech.ee using the application form on Academic Positions or directly over email CV Motivation letter Degree certificates as required by the university A research plan for the
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information for PhD admission is available at TalTech´s PhD admission homepage The following application documents should be sent to tatevik.minasyan@taltech.ee using the application form on Academic Positions
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The information for the PhD admission is available at TalTech´s web-page: https://taltech.ee/en/phd-admission The following application documents should be sent to francesco.deluca@taltech.ee CV Motivation letter
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» Materials engineering Researcher Profile First Stage Researcher (R1) Positions PhD Positions Application Deadline 27 Feb 2026 - 23:59 (Europe/Tallinn) Country Estonia Type of Contract Temporary Job Status
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at TalTech´s web-page: https://taltech.ee/en/phd-admission The following application documents should be sent to S CV Motivation letter Degree certificates as required by the university Copy of the passport
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at TalTech´s web-page: https://taltech.ee/en/phd-admission . The deadline to submit the application is: 28.02.2026 The following documents should be enclosed with the application: Applicant CV Motivation
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). Radiation stress and mass transport in gravity waves, with applications to “surf beats.” Journal of Fluid Mechanics, 13(4), 481–504. https://doi.org/10.1017/S0022112062000877 Melet, A., Meyssignac, B., Almar
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at TalTech´s web-page: https://taltech.ee/en/phd-admission The application should include: A motivation letter describing your research interests Curriculum Vitae (CV) Copies of academic transcripts and
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The information for the PhD admission is available at TalTech´s web-page: https://taltech.ee/en/phd-admission The following application documents should be sent to taavi.liblik@taltech.ee CV Motivation letter
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findings in written and oral form at conferences and in publications Engaging in interdisciplinary collaboration within Taltech and external research partners Applicants should fulfil the following