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LanguagesFRENCHLevelBasic Research FieldPhysicsYears of Research Experience1 - 4 Additional Information Eligibility criteria Extended knowledge of magnetised plasma physics (PhD), ideally in the context of tokamak plasmas
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device fabrication techniques, including sputtering, evaporation, electron-beam lithography, optical and laser lithography, reactive-ion etching and plasma etching - Physical characterization techniques
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FieldPhysicsEducation LevelPhD or equivalent LanguagesFRENCHLevelBasic Research FieldPhysicsYears of Research ExperienceNone Additional Information Eligibility criteria - PhD in physics - Research record demonstrating a
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, materials science, and wave physics. - the development of advanced micro- and nanofabrication processes based on SOI (Silicon-On-Insulator) technology - lithography - plasma etching - thin-film deposition
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project on the release of hormones, neuropeptides, and neurotransmitters by exocytosis, which is mediated by a vesicular fusion process whose mechanisms are well established. However, the mechanisms