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process control measurements, and utilizing appropriate statistical analyses to understand the assay results and their uncertainties. This process should lead to improvements in the comparability and
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Semiconductor manufacturing is a complex procedure with challenging variations in machines and processes. For example, due to high-mix semiconductor manufacturing, in which hundreds of types of products
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NIST only participates in the February and August reviews. Many industrial processes generate carbon dioxide as a by-product, which is released to the atmosphere and contributes to global warming
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the measurement of infrared radiation for applications to remote sensing, fundamental metrology, process monitoring, homeland security, defense, and biomedical areas. Specific interests include (1) the development
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://jarvis.nist.gov/) infrastructure uses a variety of methods such as density functional theory, graph neural networks, computer vision, classical force field, and natural language processing. We are currently
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lyle.levine@nist.gov 301.975.6032 Mark R. Stoudt mark.stoudt@nist.gov 301.975.6025 Description The extreme processing conditions of metal additive manufacturing create inhomogeneous materials that can include
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. An understanding of statistical analysis is important for processing the time series results of individual calculations as well as comparing multiple calculations. Experience with coding, web design and database
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, interfacial phenomena, and associated transduction processes, often at the nanoscale that allow detection. A wide variety of sensing principles (chemiresistive, capacitive, electrochemical, FET, mass loading
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disruptive events. More research is needed to understand the planning, protective, and recovery processes of its highly interdependent physical, social, and economic systems. In particular, advancements in
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assessment; 2) method development to evaluate long term particulate and VOC emission during additive manufacturing process to support robust hazard assessment and development of safe methodology for the use