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. This includes research on the optimal lithography process. Here, piecewise interference lithography will be investigated, the so called SMILE-process (Stepped Mask Interference Lithography Exposure). Objectives
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to their limits, and explore how they can be used to optimize the manufacturability, efficiency (>99.9%) and LIDT > 1J/cm2 for sub-ps pulses, of the final gratings. In parallel, the fellows will be provided with
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of spaceflight experiments and the optimization of spaceflight missions and trajectories. (https://www.irs.uni-stuttgart.de/en/ , www.hefdig.com ) Task description for your Individual Research Project (IRP
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of spaceflight experiments and the optimization of spaceflight missions and trajectories. (https://www.irs.uni-stuttgart.de/en/ ) Task description for your Individual Research Project (IRP) Problem Definition