Sort by
Refine Your Search
-
part, des micro-électrodes seront fabriquées (via lithographie à faisceau d'électrons en salle blanche) pour électropolymériser les monomères dans des conditions douces et à petite échelle sur des puces
-
Master Thesis in Physics or Materials Science: Remanent phase shifter based on memristive technology
techniques, including pulsed laser deposition (PLD), sputter deposition, electron-beam evaporation, optical lithography, and ion-beam etching. Characterization of individual layers using atomic force
-
, or related field 8+ years of nanotechnology laboratory experience Knowledge of all aspects of microfabrication technology, including thin film production, etching, lithography, and analysis Ability
-
of the FDM and Lithography printers used in the lab. Provide expertise to uses on the capabilities, strengths, and weaknesses of each type of machine and material used in the facility as it relates
-
Your Job: Fabricate memristors with Helmholtz Nano Facility (HNF) using E-beam lithography Sputter sub-stoichiometry oxides thin films to complete the lateral memristor Electrically operate and
-
Helmholtz-Zentrum Dresden-Rossendorf - HZDR - Helmholtz Association | Dresden, Sachsen | Germany | about 1 month ago
-materials in various device architectures. This is accomplished in our fully equipped cleanroom and electron beam lithography facility. The department also provides low temperature (10 mK) and high-magnetic
-
semiconductor device fabrication techniques, including lithography, CVD, dry and wet etching, metallisation and CMP processes. Close interaction with facility users, equipment engineers, suppliers and academic
-
the exfoliation and stacking of 2D materials into van der Waals heterostructures, the nanofabrication of devices (thin film deposition, electron-beam lithography, etching), and magnetotransport measurements (under
-
and patterning technologies, including EUV lithography, electron beam lithography, and directed self-assembly - Advanced semiconductor materials processing (e.g., epitaxy, atomic layer deposition, and
-
Łukasiewicz Research Network - Institute of Microelectronics and Photonics | Poland | about 2 months ago
Electrical and structural characterization of devices Operation of technological equipment, including: Photolithography and laser lithography systems Plasma etching reactors Wet oxidation furnace Scanning