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of novel optical methods for nanoscale dimensional measurements using the NIST 193 nm Microscope: a newly upgraded, custom-built, world-class high-magnification optical imaging platform optimized
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301.975.4579 Description As the demand for high resolution, high content imaging increases, the cost and challenges of acquiring, storing, processing, and analyzing today’s very large imaging data sets are even
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images. However, the current limitations of desktop computers in terms of memory, disk storage and computational power, and the lack of image processing algorithms for advanced parallel and distributed
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the measurement of infrared radiation for applications to remote sensing, fundamental metrology, process monitoring, homeland security, defense, and biomedical areas. Specific interests include (1) the development
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imaging and analysis methods, as well as collaborative efforts with other NIST laboratories for image processing and 3D visualization methods. key words Electron microscopy; Confocal microscopy
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assemblies (SolidWorks experience is preferable), experience with developing VI’s in LabVIEW, and experience with data and image processing (MATLAB experience preferable). key words Additive manufacturing
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) and superconductors (WSi, MoSi, NbTiN) for single-photon detectors, all of which are developed at NIST. In addition to device processing and electrical and optical characterization, we are interested in
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NIST only participates in the February and August reviews. Metals-based additive manufacturing (AM) processes, or metals 3D printing, such as laser powder bed fusion and directed energy deposition
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microscope (STEM) image. This is a fundamental transformation from the existing image acquisition paradigm and could enable new types of nano- and atomic-scale metrology. The Material Measurement Laboratory
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mechanical parts and assemblies (SolidWorks experience is preferable), experience with developing VI’s in LabVIEW, and experience with data and image processing (MATLAB experience preferable). [1] Huang, W