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Field
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Previous hands-on experience with semiconductor device fabrication, including e-beam lithography, optical lithography, atomic layer deposition, thin film metals deposition, scanning electron microscopy
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electrical measurements (RF circuit experience is a plus) Experience in nanofabrication, including photolithography and/or electron-beam lithography Experience with TEM specimen preparation using focused ion
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device fabrication techniques, including sputtering, evaporation, electron-beam lithography, optical and laser lithography, reactive-ion etching and plasma etching - Physical characterization techniques
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nanofabrication using optical and electron-beam lithography is highly desirable. The successful candidate should demonstrate the ability to develop independent research strategies while working effectively within a
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demonstrated skills in the following areas: (i) Fabrication of 2D materials based nanodevices using exfoliation, transfer, optical and electrical beam lithography (EBL). Strong command of EBL is required. (ii
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, Electrical Engineering, Applied Physics, or related field Hands-on cleanroom experience (stepper, e-beam lithography, dry/wet etching, thin-film deposition, bonding, micro-transfer printing) Experience with
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ferroelectric and other functional materials into photonic architectures for electro-optic and quantum transduction applications Perform full device processing using cleanroom techniques, including electron-beam
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. Experience with TEM, including Lorentz TEM and in-situ cryo experiments. Experience with nanofabrication (e.g., focused ion beam, electron-beam lithography and photolithography), transport measurements and
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-beam lithography, UHV thin-film deposition, dry/wet etching, materials and surface metrologies) Experience operating dilution refrigerators Expertise in superconducting microwave circuit design and
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the last 0-5 years) in the field of electrical engineering, experimental physics, materials science, and mechanical engineering, or related discipline Experience in electron beam lithography and/or micro