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of dislocation stress fields (in collaboration with CEA Saclay). - Program the diffraction procedures to generate images comparable to Electron Channeling Contrast Imaging (ECCI) obtained using a Scanning Electron
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dynamics, it is therefore necessary to correct aberrations over time to restore a diffraction-limited illumination beam. This will be achieved using an adaptive optics (AO) loop specially designed for in
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Postdoctoral researcher (M/F), synthesis of crystal phase heterostructures by Molecular Beam Epitaxy
outcomes. Molecular beam epitaxy (MBE) growth of GaAs nanowires on patterned Si/SiO₂ substrates. Structural analysis by electron microscopy (in situ TEM, electron diffraction, zone-axis indexing). Automated
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characterization of C and SiC fibers - Training on bench use (in particular heating techniques by Joule effect, laser diffraction, infrared imaging, pyrometry, preparation of micrometric samples, ...) - Technical