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, which function through the interaction between magnetic layers and surface acoustic waves (i.e., magnetoelastic coupling). These devices will be fabricated using magnetic thin films epitaxially grown
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of HTS thin films and hybrid heterostructures, nanofabrication of superconducting architectures, and advanced physical characterisation using transport, magnetic, and structural techniques. While
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National Aeronautics and Space Administration (NASA) | Pasadena, California | United States | about 6 hours ago
. Description: This project involves the development of new technologies for ultraviolet (UV) instrumentation and systems. Successful candidates will utilize thin-film processing and nanoscale interface
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basic and application-related research previous experience with magnetron sputtering, growth of thin films, epitaxy, power electronics, or III-nitride based semiconductor materials and/or devices, as
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basic and application-related research previous experience with magnetron sputtering, growth of thin films, epitaxy, power electronics, or III-nitride based semiconductor materials and/or devices, as
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join our group and help us developing thin film solar cells under the R2U Technology Agenda from the PRR framework. We foster a collaborative and innovative environment where a team from a diverse
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materials and structures characterization, such as profilometry, optical microscopy, SEM and AFM. Perform micro- and nano-fabrication activities, including thin film deposition, spin coating, reactive ion
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(SOI) technology, including lithography, plasma etching, thin-film deposition, and membrane release. Particular attention will be given to the realization of periodic or microstructured patterns designed
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Wetting Group headed by Prof. Robin Ras at Aalto University invites applications for a postdoctoral position in thin film deposition for an advanced antifogging technology. The position is funded from a
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Associação do Instituto Superior Técnico para a Investigação e Desenvolvimento _IST-ID | Portugal | 5 days ago
of the academic background and final grade (35%); 2) curriculum and previous experience in the development of copolymeric materials and thin film characterization (40%); 3) motivation letter (25%). The jury will