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Field
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Your Job: Fabricate memristors with Helmholtz Nano Facility (HNF) using E-beam lithography Sputter sub-stoichiometry oxides thin films to complete the lateral memristor Electrically operate and
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the nanofabrication of microdevices (using techniques such as thin film deposition, electron-beam lithography and etching), and their electrical transport characterization. A major objective is to explore
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on artificial 2D heterostructures. It will also involve the nanofabrication of microdevices (using techniques such as thin film deposition, electron-beam lithography and etching), and their electrical
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steps needed during lithography and pattern transfer during the devices microfabrication. Exclusion factors: Candidates without proven experience of at least 18 months in multilevel sensor design
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experiments to understand and improve tool performance, and – most importantly – by summarizing findings in white papers and application notes. A full job description can be found here: https://mitnano.mit.edu
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atomic force microscopy - Magneto-optical microscopy - X-ray spectroscopy - Optical lithography - PIC measurements - Data analysis and modeling - Writing of scientific reports and papers The project will
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the exfoliation and stacking of 2D materials into van der Waals heterostructures, the nanofabrication of devices (thin film deposition, electron-beam lithography, etching), and magnetotransport measurements (under
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meta-IOLs. Explore new horizons at the interface between polymer engineering and cleanroom nanofabrication (electron-beam lithography, reactive ion etching, atomic later deposition). MPQ cleanroom in
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ability. Excellent communication skills: both oral and written. Knowledge of clean room equipment operation for thin-film deposition, diffusion, oxidation, lithography and etching, including wet and dry
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) on the ARTEM campus in Nancy. Travel within Europe is to be expected. Team 104 “Nanomaterials for Optoelectronics” (https://NanoOptoSpin . ijl.cnrs.fr) of the IJL's Physics of Matter and Materials (P2M