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meta-IOLs. Explore new horizons at the interface between polymer engineering and cleanroom nanofabrication (electron-beam lithography, reactive ion etching, atomic later deposition). MPQ cleanroom in
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) on the ARTEM campus in Nancy. Travel within Europe is to be expected. Team 104 “Nanomaterials for Optoelectronics” (https://NanoOptoSpin . ijl.cnrs.fr) of the IJL's Physics of Matter and Materials (P2M
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(SOI) technology, including lithography, plasma etching, thin-film deposition, and membrane release. Particular attention will be given to the realization of periodic or microstructured patterns designed
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of the project with the different partners. Where to apply Website https://emploi.cnrs.fr/Candidat/Offre/UPR2940-ELOBER-142/Candidater.aspx Requirements Research FieldPhysicsEducation LevelPhD or equivalent
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meta-IOLs. Explore new horizons at the interface between polymer engineering and cleanroom nanofabrication (electron-beam lithography, reactive ion etching, atomic later deposition). MPQ cleanroom in
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the reconfigurable logic gates designed by artificial intelligence. The candidate will carry out nanofabrication by deposition, UV or maskless lithography and etching of the waveguide circuit and e-beam lithography