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, high power energy applications and more. MATTER Lab is a Research group at the University of Tartu (UT), Institute of Technology established by H2020 ERA Chair actions between 2020-2025. MATTER combines
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of transportation systems (electric vehicles, trains, electric-powered ships, and more electric airplanes and all-electric airplanes in the research and development phase), the widespread use of power electronics
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-voltage PPU that shall power the E-Sail electron emitter, sail and associated devices. The E-Sail electron gun needs a power-processing-unit to provide the required voltages and currents. As a start
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Regulations: Law No. 40/2004, of 18 August, as amended (Statute of the Scientific Research Fellow), and Regulation of Research Grants of the Fundação para a Ciência e a Tecnologia, currently in force: https
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at the department. The main supervisor will be Prof. Dr. Kathy Lüdge from TU Ilmenau. Where to apply Website https://jobundkarriere.tu-ilmenau.de/jobposting/80cd5964173be4cf2a6646500503798… Requirements Research
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program under the MARIE SKŁODOWSKA-CURIE grant agreement no 101227277. Research areas : DC6: Electron Emitter for E-sail Terms : The position is limited to 36 months. The period of
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Engineering » Mechanical engineering Engineering » Electronic engineering Researcher Profile First Stage Researcher (R1) Positions Research Support Positions Country Türkiye Application Deadline 24 Dec 2025
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Inria, the French national research institute for the digital sciences | Paris 15, le de France | France | 27 days ago
, with a researcher, an engineer, and a postdoctoral scholar. You will be involved in state-of-the-art research in ambient-powered biodegradable RFID electronics involving both standard silicon CMOS design
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basic and application-related research previous experience with magnetron sputtering, growth of thin films, epitaxy, power electronics, or III-nitride based semiconductor materials and/or devices, as
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basic and application-related research previous experience with magnetron sputtering, growth of thin films, epitaxy, power electronics, or III-nitride based semiconductor materials and/or devices, as