198 application-programming-android-"Prof" Fellowship positions at Nanyang Technological University
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The School of Chemistry, Chemical Engineering and Biotechnology (CCEB) invites applications for the position of Research Fellow. We are looking for skilled chemist to design and preparation
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Optimization for 3D design process, particularly in the automotive applications of polymer and metallic powders and laser added 3D printing. Knowledge of engineering design, multidisciplinary design optimization
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Optimization for 3D design process, particularly in the automotive applications of polymer and metallic powders and laser added 3D printing. Knowledge of engineering design, multidisciplinary design optimization
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advanced manufacturing, mechatronics, innovative design, nanotechnology, and biomedical and computational applications. The School of Mechanical and Aerospace Engineering (MAE) invites applications
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could help in this case. Also, data management is important to improve the efficiency of solutions. Job Requirements: Preferably PhD in Computer Science or related field. Expertise in computer programming
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be required to lead a project under a larger research programme between Singapore and China. The candidate should fulfill the following responsibilities: Design, perform, and optimize experiments with
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develop innovative delivery platforms for applications in aquaculture health and therapeutic development. Key Responsibilities: Conduct microbiological research on host–microbe interactions relevant
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Schaeffler Hub for Advanced Research at NTU is a collaborative research center between Nanyang Technological University and Schaeffler Group. The Schaeffler SHARE program comprises a global research
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of faculty, students and alumni who are shaping the future of AI, Data Science and Computing. The College of Computing & Data Science (CCDS) invites applications for the position of Research Fellow. Key
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The NTI-NTU Corporate Laboratory invites applications for the position of Research Fellow. Key Responsibilities: Design, planning, and setting up of a new plasma enhanced chemical vapor deposition