185 structures "https:" "https:" "https:" "https:" "https:" "https:" "Imperial College London" positions at NIST in United States
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. Such “next generation” devices will depend on new materials and innovative device structures. Thin-film PV devices, also called second generation devices, are becoming competitive with Si-based technologies
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based on a planar lipid bilayer architecture to complement neutron scattering studies on peripheral membrane protein structure. The first, bilayer overtone analysis, involves measurement of the electric
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advance our ability to accurately predict increasingly complex burning scenarios (e.g., varied sample/product configuration and scale). Further details of the project are available online: https
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, Materials and Structural Systems Division opportunity location 50.73.11.C1032 Gaithersburg, MD NIST only participates in the February and August reviews. Advisers name email phone Stephanie J. Watson
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microscopy and spectroscopy (STM/STS), and atomic force microscopy (AFM). Topics of interest include (1) energy level spectroscopy of quantum confined structures and two-dimensional electron systems, including
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.; McLinden, M. O., Nuclear Magnetic Resonance (NMR) Spectroscopy for the in situ Measurement of Vapor-Liquid Equilibria. J. Chem. Engr. Data 2020, https://pubs.acs.org/doi/10.1021/acs.jced.0c00113 . Nuclear
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are encouraged to submit research proposals on the following topics: DFT and MD for computational dielectric spectroscopy Properties of electrochemical double layer (effects on the local polarization, structure
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details of regulatory mechanisms for ERK1/2 is a timely and important goal. Structural, biochemical, and biophysical experiments carried out by Natalie Ahn's lab and others have established key aspects
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the mechanical properties of polymer thin films change under confinement. We are applying a wrinkling-based metrology to elucidate the mechanical response of confined and/or structured polymer films. Of interest
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these issues. On-wafer measurements of thin-film devices allows us to measure the impedance of planar thin-film-based structures at frequencies up to 100 GHz. When combined with more traditional impedance