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groundbreaking electron-beam lithography (EBL) methods that will redefine what is achievable in quantum device fabrication. You will push lithography resolution limits down to the quantum regime, demonstrating
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groundbreaking electron-beam lithography (EBL) methods that will redefine what is achievable in quantum device fabrication. You will push lithography resolution limits down to the quantum regime, demonstrating
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electron-beam lithography (EBL) methods that will redefine what is achievable in quantum device fabrication. You will push lithography resolution limits down to the quantum regime, demonstrating
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microfabrication including quantum dot imaging, UV and e-beam lithography, reactive ion etching and wet chemical etching and metal deposition (PhD2). Perform optical characterization of the fabricated devices in