Sort by
Refine Your Search
-
Listed
-
Category
-
Employer
-
Field
-
*************************************************************************** Application and Assessment Procedure Your application including all attachments must be in English and submitted electronically by clicking APPLY NOW below. Please include: Motivated letter of application (max
-
industrial processes. Your research will drive a paradigm shift in how TES systems are modelled, integrated, and controlled within industrial settings. You will develop novel, adaptive, physics-informed models
-
Training: Conduct Silvaco TCAD simulations (fabrication processes, device modeling, and circuit-level simulations) . Experimental Work: Participate in cleanroom processes, device fabrication, and electrical
-
the relevant union. The position is part of DTU’s Tenure Track program. Read more about the program and the recruitment process here . You can read more about career paths at DTU here . Further information
-
motivated candidate with a background in chemical or process engineering and strong experimental and analytical skills. Join us to drive innovation in carbon capture and contribute to shaping Europe’s low
-
Job Description Do you want to contribute to a greener future where state-of-the-art scanning nitrogen vacancy (NV) magnetometry is introduced to visualize buried functional processes in energy
-
in catalysis Good language skills *************************************************************************** Application and Assessment Procedure Your application including all attachments must be in
-
computer programming language is expected. You must have a two-year master's degree (120 ECTS points) or a similar degree with an academic level equivalent to a two-year master's degree. Approval and
-
strong guidance from academic supervisors as well as from industrial experts. Responsibilities and qualifications Polishing is one of the last steps of the manufacturing process chain for industrial tools
-
-high-resolution lithographic processes: You will explore and refine unconventional electron-beam resists (e.g., HSQ, metal fluorides, alkali halides) to reliably achieve robust pitches below 15 nm