56 phd-scholarship-for-solid-mehanical-engineering-in-image-processing Postdoctoral positions at Argonne
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The Chemical Sciences and Engineering Division invites you to apply to a postdoctoral appointee opening. The successful candidate will perform research in the Interfacial Processes Group
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A postdoc position is immediately available at the Advanced Photon Source of Argonne National Laboratory. This position will involve developing X-ray coherent scattering imaging techniques
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relevant field at the PhD level with zero to five years of employment experience. Experience with deep learning frameworks (PyTorch, TensorFlow, JAX). Strong background in computational image processing and
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such as PyTorch and TensorFlow. Experience with high-performance computing and/or scientific workflow. Strong background in inverse problems, numerical optimization and image processing. Job Family
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-impact, interdisciplinary research. Position Requirements Recent or soon-to-be-completed PhD (typically completed within the last 0-5 years in chemical engineering, mechanical engineering, process systems
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The X-ray Imaging Group (IMG) of the Advanced Photon Source (APS) is seeking a postdoctoral researcher with expertise in computational science and image processing to develop innovative methods
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of chemical and electrochemical principles to control and improve product morphology, product quality, and process efficiency at engineering scales. With guidance, the appointee will : Develop novel process
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staff scientists, engineers, postdocs, and students, with an active research portfolio that spans: Leading electron-scattering experiments at Jefferson Lab (CLAS12, SoLID, Hall A, B, and C) Major
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apply funding from federal agencies (e.g., the Department of Energy and National Science Foundation). A successful candidate should have a solid background in power system engineering, optimization
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. Education: Ph.D. (< 5 yrs. since Ph.D.) • Familiarity with image processing and simulation software. • (Preferred) Experience with nanofabrication, transport measurements, thin film deposition, in-situ TEM