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. Furthermore, there is a need to understand how EUV resists may interface with other processing approaches such as block copolymer lithography. This project will utilize chemically sensitive scattering tools
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, toxicology, statistics, and computer programming are applicable. key words Forensics; Forensic Science; Toxicology; Statistics; Mass Spectrometry; Drugs; Chemometrics; Analytical Chemistry Eligibility
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particle dynamics (CFPD), a fluid-particulate coupled algorithm, to (i) quantify breath device operation (i.e., species deposition, complex fluid flow) [1], (ii) guide experimental breath species collection
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tools to enable early and accurate diagnoses of disease as well as studies to elucidate mechanisms and networks in complex biological systems. Project areas include biochemical/molecular biology process
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Semiconductor manufacturing is a complex procedure with challenging variations in machines and processes. For example, due to high-mix semiconductor manufacturing, in which hundreds of types of products
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certainly impact the design of inhibitors towards ERK1/2. We have only scratched the surface of this important problem, and our discoveries to date now set the stage for deeper examination. Needed are further
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sensors for measurements before and during manufacturing processes, analyze the data with a fusion of metrological approaches and machine learning, and monitor and predict the performance of machines and
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these methodologies in such diverse areas as the calculation of global warming potentials and of rates of chemical reactions on nanoparticle surfaces. Simulation of reactive processes on metallic surfaces and on
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are developing microfluidics to measure material properties and structure. Protein, polymer and surfactant solutions and suspensions and emulsions are being characterized using computer-controlled microfluidic
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changes from physical or chemical processing, the addition of other measurement modalities and/or using more sophisticated machine learning techniques. The proposal will emphasize the role of metrology