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thermodynamic descriptions to model diffusion processes in a variety of disordered and ordered metallic systems. The next challenge is to model the diffusion mobilities in complex materials where a Calphad-type
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of aqueous chemical models, incorporated into computer codes, for both pure and applied research that include industrial chemistry, chemical engineering, water treatment, hydrometallurgy, toxicology, medical
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measurement technique development (e.g., orbitrap and high-through put separation techniques (e.g., ESI PrepFAST)), standard reference and proficiency testing materials development and characterization, quality
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; and (2) experiments devoted to studies of quantum-state engineering and entanglement with application to quantum-information processing, quantum simulation, spectroscopy, and tests of quantum mechanics
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-acquisition circuitry, and signal-processing/pattern-recognition algorithms. The sensors must be tailored for the particular nature of a given chemical or biochemical measurement problem by optimizing and
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been largely limited due to the inability to systematically control polymer sequence especially under real-world conditions where process history, crystallization, and degradation cannot be neglected
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formation, and dynamical surface processes occurring during vapor/gas phase chemical processes. Available resources include chemical vapor and atomic layer deposition systems with optical diagnostic tools
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assessment; 2) method development to evaluate long term particulate and VOC emission during additive manufacturing process to support robust hazard assessment and development of safe methodology for the use
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@nist.gov 301.975.6740 Description With the development of nanoparticle and colloidal technologies that include processing in the dispersed phase (or are fundamentally liquid phase processes), there is a need
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on accurate understanding of physical processes that affect level populations and radiation transport in plasmas. In our research of very hot plasmas we perform precise calculations of basic atomic and