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Argonne National Laboratory is seeking a highly skilled Postdoctoral Researcher to work in the Applied Materials Division (AMD). In this position the successful candidate will conduct applied
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Postdoctoral Appointee - Uncertainty Quantification and Modeling of Large-Scale Dynamics in Networks
Requirements Required skills, abilities, and knowledge: Recent or soon-to-be completed PhD (within the last 0-5 years) by the start of the appointment in computer science, electrical engineering, applied
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information for three references For questions or additional information, please contact Jinlong Zhang at zhangjl@anl.gov . Review of applications will begin once a complete application is received and will
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The Data Science and Learning Division (DSL) at Argonne National Laboratory is seeking a postdoctoral researcher to conduct cutting edge molecular and microbiology work to enhance non-proliferation
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The Applied Materials Division (AMD) at Argonne National Laboratory is looking to hire a Postdoctoral Appointee – Materials Science. The Applied Materials Division conducts applied research
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and is based at Argonne National Laboratory (Lemont, Illinois). Position Requirements Recent or soon-to-be-completed PhD (within the last 0-5 years) in high energy physics, or a related field Experience
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facilities. Collaboration with researchers at Fermilab, the University of Chicago, and Northwestern University is strongly encouraged. Applicants should submit Curriculum vitae Brief statement of research
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time The expected hiring range for this position is $70,758.00-$117,925.00. Please note that the pay range information is a general guideline only. The pay offered to a selected candidate will be
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and simulation of the electronic structure of polycrystalline and defective two-dimensional materials. Interviews will begin immediately and continue until the position is filled. This position centers
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The Microscopy group in X-ray Science Division of Advanced Photon Source at Argonne National Laboratory is seeking postdoctoral researchers to work on cutting-edge ptychography technique development