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University of Warsaw: Faculty of Mathematics, Informatics and Mechanics | Poland | about 1 month ago
a competition for the position of postdoctoral position (assistant professor) in the NCN Sonata-18 project entitled: Parallel and exact algorithms for path problems in directed graphs. About the
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algorithms in the context of sparse optimization and applications in real world data sets. We are also interested in exploring opportunities for parallelism of the completion process, highlighting
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behavioral, autonomic, and electrophysiological correlates of galvanic vestibular stimulation (GVS). Over the years, GVS has been shown to influence various perceptual and cognitive processes, including higher
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Jülich (FZJ). The main objective of the project is to incorporate a memristor-based template library into the processing elements of a cellular neural network in order to achieve programmable parallel
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algorithms. Testing with actual robotic platforms is handled by Demcon. Innovative simulation data is used for both training and testing. The project is in parallel with our dedication to teaching perception
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, communication algorithms) Parallel programming models and runtimes for emerging architectures (e.g., processing-in-memory, SRAM-centric) Performance modelling & optimisation of ML algorithms on unconventional
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/or mixed-methods; no parallel enrollment in another PhD programme; fluent English language skills are a must; knowledge of Bulgarian is an asset; no previous contractual links to the IPS at any point
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needs, we may support flexible and hybrid work arrangements. Options will be discussed during the interview process? Responsibilities The division runs several research projects in parallel. The candidate
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Inria, the French national research institute for the digital sciences | Pau, Aquitaine | France | 2 months ago
of this project is to develop advanced numerical strategies for passive imaging of the Earth and the Sun. The position focuses on enhancing the capabilities of our massively parallel software, Hawen (https
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terms of electrical performance and manufacturing complexity (number of manufacturing processes and dispersion tolerance). The best architectures will be designed (mask layout), in close collaboration