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a focus on polymers, elastomers, or biomaterials. You must have a two-year master's degree (120 ECTS points) or a similar degree with an academic level equivalent to a two-year master's degree
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-of-the-art in incorporating considerations beyond efficiency in urban transportation planning to improve societal outcomes while fostering collaboration with Cornell University. Your primary tasks will be
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on the application material, and an application must include: Motivated application. Curriculum Vitae. Master’s and bachelor’s degree certificates or equivalent, including transcripts of grades (copy of original
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. You must have a two-year master's degree (120 ECTS points) or a similar degree with an academic level equivalent to a two-year master's degree. Approval and Enrolment The scholarship for the PhD degree
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training, and you will, in addition, sharpen your didactics skills through experience as a teaching assistant. You must have a two-year master's degree (120 ECTS points) or a similar degree with an academic
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collaborations with numerous internationally leading universities and research organizations. You must have a two-year master's degree (120 ECTS points) or a similar degree with an academic level equivalent to a
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have a two-year master's degree (120 ECTS points) or a similar degree with an academic level equivalent to a two-year master's degree. Approval and Enrolment The scholarship for the PhD degree is subject
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PhD scholarship in Runtime Multimodal Multiplayer Virtual Learning Environment (VLE) - DTU Construct
, enhancing their expertise in NaTech risk and resilience and enabling their integration into European and international research and innovation landscapes. Responsibilities and qualifications Your primary
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-year master's degree (120 ECTS points) or a similar degree with an academic level equivalent to a two-year master's degree. Approval and Enrolment The scholarship for the PhD degree is subject to
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technology, positioning your career for long-term success and global scientific impact. Your primary role will be to pioneer and optimize advanced electron-beam lithography techniques to demonstrate reliable