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. The successful candidate will characterize spin oscillators using high-speed/frequency electrical test stands and fabricate appropriate samples using electron beam lithography. Experience with electronic transport
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lithography and/or atomic layer deposition and/or gate dielectric characterization methods will be considered favorably. Dutie and Responsibilities Develop, operate, and characterize semiconductor device
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research activity of the group on nanostructured superconductors for applications in quantum technologies (SuperQMat group, https://icmab.es/superconducting/superqmat ) The position is in the framework
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the reconfigurable logic gates designed by artificial intelligence. The candidate will carry out nanofabrication by deposition, UV or maskless lithography and etching of the waveguide circuit and e-beam lithography
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that have been previously attacked using more numerical approaches. For example, some members of the DAG group are currently working on metrology and inverse lithography problems with ASML using discrete
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lithography Willingness and ability to work effectively as part of a team and provide student and classroom support Strong command of German and English (both written and spoken - level B2+) What We Offer
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Łukasiewicz Research Network – PORT Polish Center for Technology Development | Poland | 2 months ago
; independently conducting technological processes (including optical lithography, plasma etching, thin film deposition) and measurements (including ellipsometry, profilometry); • documenting and reporting
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(PRTR). Where to apply Website https://jobs.icfo.eu/?detail=1056 Requirements Research FieldEngineering » Electronic engineeringEducation LevelMaster Degree or equivalent Research FieldEngineering
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Description Mission: Develop an innovative lithography system based on atomic diffraction within the framework of the UPC CHIP Chair, in collaboration with Lace Lithography. Functions to be developed: Analyze
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promising designs will then be validated experimentally, first in a controlled academic prototype and subsequently on a lithography scanner stage demonstrator in collaboration with ASML. The PhD is supervised