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Helmholtz-Zentrum Dresden-Rossendorf - HZDR - Helmholtz Association | Dresden, Sachsen | Germany | 8 days ago
-materials in various device architectures. This is accomplished in our fully equipped cleanroom and electron beam lithography facility. The department also provides low temperature (10 mK) and high-magnetic
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or nanophotonic device design Hands-on experience with cleanroom fabrication techniques (e.g., electron-beam lithography, thin-film deposition, nanostructuring) Knowledge of numerical electromagnetic simulations
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the competent authority of the MESR Where to apply Website https://emploi.cnrs.fr/Candidat/Offre/UMR6072-SOPRAS-011/Candidater.aspx Requirements Research FieldEngineeringEducation LevelPhD or equivalent Research
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. The key objective is to support efforts to advance fundamental and high-impact research. For more details, please view http://www.ntu.edu.sg/spms . Join the laboratory of Shilei Ding at SPMS. We are seeking
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PREM Center for quantum materials innovation and education excellence (CQMIEE) at UCF (https://prem2.cecs.ucf.edu/). Khondaker group’s current interest is in the discovery of exotic electronic and
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. The key objective is to support efforts to advance fundamental and high-impact research. For more details, please view https://www.ntu.edu.sg/spms. Join the laboratory of Shilei Ding at SPMS. We are looking
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semiconductor device fabrication techniques, including lithography, CVD, dry and wet etching, metallisation and CMP processes. Close interaction with facility users, equipment engineers, suppliers and academic
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Your Job: Fabricate memristors with Helmholtz Nano Facility (HNF) using E-beam lithography Sputter sub-stoichiometry oxides thin films to complete the lateral memristor Electrically operate and
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Website: https://engineering.uark.edu/ Summary of Job Duties: The Postdoctoral Fellow will conduct experimental research in advanced manufacturing, surface engineering, and tribological performance
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of high‑tech system design—such as the design of lithography machines—can already be automated, current design‑automation tools remain limited to specific domains or subsystems. Given the growing complexity