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Master Thesis in Physics or Materials Science: Remanent phase shifter based on memristive technology
techniques, including pulsed laser deposition (PLD), sputter deposition, electron-beam evaporation, optical lithography, and ion-beam etching. Characterization of individual layers using atomic force
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, or related field 8+ years of nanotechnology laboratory experience Knowledge of all aspects of microfabrication technology, including thin film production, etching, lithography, and analysis Ability
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. The key objective is to support efforts to advance fundamental and high-impact research. For more details, please view http://www.ntu.edu.sg/spms . Join the laboratory of Shilei Ding at SPMS. We are seeking
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of Technology and Design. With some 200 staff and students, it offers a friendly and international work environment Learn more about CQT at https://www.cqt.sg/ Job Description We are looking for a Research Fellow
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cleanroom fabrication (lithography, etching, metallization). Conduct electrical and optical characterization of Si, PCD and SiC resonators. Work closely with a postdoctoral researcher to support validation
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of the FDM and Lithography printers used in the lab. Provide expertise to uses on the capabilities, strengths, and weaknesses of each type of machine and material used in the facility as it relates
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for the recruitment of 1 Doctorate Initial level within the scope of Associate Laboratory in Chemical Engineering ALiCE - LA/P/0045/2020, with DOI 10.54499/LA/P/0045/2020 (https://doi.org/10.54499/LA/P/0045/2020
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the competent authority of the MESR Where to apply Website https://emploi.cnrs.fr/Candidat/Offre/UMR6072-SOPRAS-011/Candidater.aspx Requirements Research FieldEngineeringEducation LevelPhD or equivalent Research
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Your Job: Fabricate memristors with Helmholtz Nano Facility (HNF) using E-beam lithography Sputter sub-stoichiometry oxides thin films to complete the lateral memristor Electrically operate and
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Helmholtz-Zentrum Dresden-Rossendorf - HZDR - Helmholtz Association | Dresden, Sachsen | Germany | about 1 month ago
-materials in various device architectures. This is accomplished in our fully equipped cleanroom and electron beam lithography facility. The department also provides low temperature (10 mK) and high-magnetic