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. The successful candidate will characterize spin oscillators using high-speed/frequency electrical test stands and fabricate appropriate samples using electron beam lithography. Experience with electronic transport
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such as mechanical exfoliation and stacking, as well as characterization methods including AFM, SEM, and optical microscopy. Experience with advanced nanofabrication techniques such as e-beam lithography
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and patterning technologies, including EUV lithography, electron beam lithography, and directed self-assembly - Advanced semiconductor materials processing (e.g., epitaxy, atomic layer deposition, and
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Łukasiewicz Research Network – PORT Polish Center for Technology Development | Poland | 2 months ago
; independently conducting technological processes (including optical lithography, plasma etching, thin film deposition) and measurements (including ellipsometry, profilometry); • documenting and reporting
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research activity of the group on nanostructured superconductors for applications in quantum technologies (SuperQMat group, https://icmab.es/superconducting/superqmat ) The position is in the framework
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lithography Willingness and ability to work effectively as part of a team and provide student and classroom support Strong command of German and English (both written and spoken - level B2+) What We Offer
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(PRTR). Where to apply Website https://jobs.icfo.eu/?detail=1056 Requirements Research FieldEngineering » Electronic engineeringEducation LevelMaster Degree or equivalent Research FieldEngineering
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piezoeléctricos/Sputtering of piezoelectric materials • Litografía óptica y por haz de electrones, metalización y ataque por plasma/Electron beam and optical lithographies, metallization, plasma etching
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rapid prototyping capabilities like lithography, 3D printing and laser cutting, construction and connection technology labs, as well as various metrology laboratories. This research center is part of
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DTU Tenure Track Assistant Professor in Nanofabrication of Photonic Integrated Circuits for Quant...
application of DUV stepper lithography for printing of ultra-resolution structures by means of phase-masks, lithography-etch/lithography-etch (LELE), and multi-exposure methods. Responsibilities and