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Field
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. Extension may be possible contingent upon future funding. Previous hands-on experience with semiconductor device fabrication is required. Experience working with high resolution e-beam lithography, optical
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spoken) – Level C1 (Common European Framework of Reference for Languages) and French (spoken) – Level B1. - Proficiency in UV lithography and electron beam lithography processes for the manufacture
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(SOI) technology, including lithography, plasma etching, thin-film deposition, and membrane release. Particular attention will be given to the realization of periodic or microstructured patterns designed
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such as mechanical exfoliation and stacking, as well as characterization methods including AFM, SEM, and optical microscopy. Experience with advanced nanofabrication techniques such as e-beam lithography
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Expected skills: • Microelectronic technologies (lithography, etching, material deposition, etc.) • Deposition of sensitive materials (superconductors, metal-insulator transitions, oxides, etc.) • Experience
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. The successful candidate will characterize spin oscillators using high-speed/frequency electrical test stands and fabricate appropriate samples using electron beam lithography. Experience with electronic transport
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fabrication, electron beam lithography nanofabrication, low temperature magneto-transport, scanning tunneling microscopy, scanning near field optical microscopy, low temperature optical microscopy. FLSA Exempt
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lithography nanofabrication, low temperature magneto-transport, scanning tunneling microscopy, scanning near field optical microscopy, low temperature optical microscopy. FLSA Exempt Full Time/Part Time Full
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meta-IOLs. Explore new horizons at the interface between polymer engineering and cleanroom nanofabrication (electron-beam lithography, reactive ion etching, atomic later deposition). MPQ cleanroom in
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the reconfigurable logic gates designed by artificial intelligence. The candidate will carry out nanofabrication by deposition, UV or maskless lithography and etching of the waveguide circuit and e-beam lithography