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, electron and optical lithography, reactive ion etching, as well as surface treatment (ALD, CVD, …). Classical analysis via SEM, AFM, XPS, Raman will be required. Finally, quantum analysis is required in
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for lithography, etching, thin film deposition or other micro- and nanofabrication equipment. You have distinguished yourself as a promising researcher in your doctorate. You are profoundly interested in coaching
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) * electromagnetic design of device using soft-ware such as comsol *clean room fabrication using both optical and e beam lithography *Optoelectronic characterization of infrared sensor (I-V, photocurrent spectrum
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synthesis, biofabrication/bioprinting (lithography-based technologies), and materials characterization techniques experience conducting original research and/or engaging in scholarly activity a developing
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– biomaterials, bioengineering, tissue engineering and regenerative medicine demonstrated proficiency in biomaterials synthesis, biofabrication/bioprinting (lithography-based technologies), and materials
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advantageous: magnetic thin film preparation, optical and e-beam lithography, electrical transport measurements, micromagnetic calculations, and magnetic domain observation.
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optical lithography, as well as other micro/nanofabrication techniques. Expertise in device fabrication and van der Waals hetero-assembly of layered materials Experience with electronic characterisation
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devices that will be fabricated using cleanroom lithography methods, as well in the NBL dedicated maker space, and outside facilities. The postdoctoral associate will be responsible for carrying out
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. Extension may be possible contingent upon future funding. Previous hands-on experience with semiconductor device fabrication is required. Experience working with high resolution e-beam lithography, optical
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role – from microscopes to telescopes, but also for advanced lithography. For the next-generation “hyper-NA” lithographic tool of ASML, the demands of keeping the wafer surface at the focal point