Sort by
Refine Your Search
-
Listed
-
Category
-
Country
-
Employer
- AALTO UNIVERSITY
- Eindhoven University of Technology (TU/e)
- Karlsruher Institut für Technologie (KIT)
- Purdue University
- ;
- CONSEJO SUPERIOR DE INVESTIGACIONES CIENTÍFICAS
- DAAD
- Eindhoven University of Technology (TU/e); yesterday published
- Empa
- Free University of Berlin
- Nature Careers
- Paul Scherrer Institut Villigen
- Technical University Of Denmark
- Technical University of Denmark
- Technical University of Denmark;
- The University of Iowa
- University of Antwerp
- University of Texas at El Paso
- 8 more »
- « less
-
Field
-
such as thin film deposition, lithography, or cryogenics is highly desirable. Good communication skills and fluency in English. Specific Requirements Interested candidates should send a full CV, a Letter of
-
groundbreaking electron-beam lithography (EBL) methods that will redefine what is achievable in quantum device fabrication. You will push lithography resolution limits down to the quantum regime, demonstrating
-
of a suitable SMA microrobots layout Rapid prototyping (clean room technology, e.g., optical lithography, 3D printing, laser technology) Development, characterization and control of demonstrator variants
-
prototyping (optical lithography, 3D printing, laser technology) Development, characterization and control of cooling demonstrator variants Simulation-based design optimization The IMT is equipped with an array
-
, are not well applicable to manufacturing systems where control involves properties of the manufactured goods, such as the wafers in lithography machines. Furthermore, to make supervisors performance aware
-
are post-docs, post-graduates or apprentices. Altogether, PSI employs 2300 people. For the Advanced Lithography and Metrology Group in the Laboratory for X-ray Nanoscience and Technologies we are looking
-
groundbreaking electron-beam lithography (EBL) methods that will redefine what is achievable in quantum device fabrication. You will push lithography resolution limits down to the quantum regime, demonstrating
-
with electromagnetic modeling and simulation software for metamaterials, specifically COMSOL. Demonstrated expertise in nanofabrication techniques, particularly lithography and thin-film deposition
-
electron-beam lithography (EBL) methods that will redefine what is achievable in quantum device fabrication. You will push lithography resolution limits down to the quantum regime, demonstrating
-
characterization, as stamping techniques, lithography, Raman, XPS, TGA, ssNMR, Tof-SIMS, EA, FTIR. C02 – Precision covalent chemistry for tailored mol2Dmat heterostructures (Dr. Chen) • Screening and synthesis