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from energy solutions to healthcare innovations. Some parts of the design of these high-tech systems - lithography machines – can be automated. However, current design automation solutions are limited
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. Phys. Lett. 123, (2023)]. Background The revolutionary introduction of EUV lithography was the culmination of several decades of collaborative work between industry and science – a Project Apollo of the
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microfabrication of widebandgap semicondcutors, including lithography, etching, wet benches, and thin film deposition. Self-motivated research with excellent leaning, analytical and problem-solving creativity
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scanner, AIXTRON MOCVD G10 epitaxy reactor, electron beam lithography, diverse plasma etching tools, wafer-level bonding equipment and others. The position builds on the pioneering work in the foundry
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electrical benchtop experiments. Hands-on experience with microfabrication of widebandgap semicondcutors, including lithography, etching, wet benches, and thin film deposition. Self-motivated research with
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, are not well applicable to manufacturing systems where control involves properties of the manufactured goods, such as the wafers in lithography machines. Furthermore, to make supervisors performance aware
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, such as the wafers in lithography machines. Furthermore, to make supervisors performance aware and thus go beyond relatively straightforward safety and progress properties, system requirements related
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techniques (lithography-based) to manufacture highly controlled three-dimensional electrode structures. Strong collaboration is expected with other project partners in areas such as multiscale modelling