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groundbreaking electron-beam lithography (EBL) methods that will redefine what is achievable in quantum device fabrication. You will push lithography resolution limits down to the quantum regime, demonstrating
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heterostructures and transition metal oxide membranes using a Heidelberg Nanofrazor scanning thermal probe lithography system. The project is 2/3 funded by an Alliance Stipend collaboration with EPFL, combining
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groundbreaking electron-beam lithography (EBL) methods that will redefine what is achievable in quantum device fabrication. You will push lithography resolution limits down to the quantum regime, demonstrating
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electron-beam lithography (EBL) methods that will redefine what is achievable in quantum device fabrication. You will push lithography resolution limits down to the quantum regime, demonstrating
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of the devices in the state-of-the-art DTU Nanolab cleanroom facilities using quantum dot imaging, lithography, etching and metal deposition. In both projects, the overall objective is to increase the efficiency