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structures for single photon emitters, a key component of the future quantum technologies that will revolutionize society. He/she will develop nanostructures by molecular beam epitaxy (MBE) and will perform
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state-of-the-art lab methodology, comprising electron beam lithography (EBL), oxide sputtering, atomic force microscopy (AFM), and transport measurements. WORK-LIFE BALANCE: We offer flexible working
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the high-energy electrons and the laser pulse [2-4], and (ii) the use of multiple foils to focus the electron beam to very small size, and use the focused electron beam itself as the source of strong fields
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for new applications in microelectronics (silicidation for electrical contacts) and photonics (waveguide writing). The researcher will also be responsible for implementing beam-shaping techniques to produce
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films and test their structural and electrical properties for use as photovoltaic electrodes. The idea is to induce nanowire aggregation within a polymer matrix using an optical beam confinement method
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School of Electrical and Electronic Engineering is one of the founding Schools of the Nanyang Technological University. Built on a culture of excellence, the School is renowned for its high academic
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Centre de Mise en Forme des Matériaux (CEMEF) | Sophia Antipolis, Provence Alpes Cote d Azur | France | 1 day ago
of material deposited, while maintaining the expected accuracy. Part of the activity will also involve implementing Artificial Intelligence (AI) methods similar to computer vision to facilitate this prediction
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students also are expected to take up teaching assistant tasks. The experimental work involves the study of clusters in molecular beams using mass spectrometry, infrared and visible light spectroscopy using
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algorithms into electron impact ion sources as well as tackle changes over time in ISOL systems, to ensure an optimal tuning at any point in time during operation. Where to apply Website https://www.sckcen.be
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FELLOW 7 (IF, Marseille, France): Laser damage resistance of materials and structures of pulse compressor GWS FELLOW 8 (UEF, Joensuu, Finland): Direct electron beam writing of pulse compressor GWS for high