Sort by
Refine Your Search
-
Listed
-
Category
-
Country
-
Program
-
Field
-
position primarily responsible for overseeing our new Raith Voyager 6 Electron Beam Lithography tool, purchased through the QCORE (Building Quantum Capacity, Operational Resilience and Equity: https
-
experience in nanofabrication, including Electron Beam Lithography, thin film deposition, dry and wet etching. You will have prior experience in low temperature technology, including dilution refrigeration
-
, chemistry, or related fields, or equivalent research experience. Candidates should demonstrate expertise in the following areas (not all mandatory, but strongly preferred): Electron beam lithography (EBL
-
chain: growth of ferroelectric thin films and 2DEGs (PLD, sputtering), nanofabrication in a cleanroom environment (UV and/or e-beam lithography), and electrical characterization (transport and
-
position primarily responsible for overseeing our new Raith Voyager 6 Electron Beam Lithography tool, purchased through the QCORE (Building Quantum Capacity, Operational Resilience and Equity: https
-
field. - Significant experience, including process development, in semiconductor device fabrication, including wafer cleaning and handling, lithography mask layout, optical or electron beam lithography
-
National Aeronautics and Space Administration (NASA) | Pasadena, California | United States | 21 minutes ago
tape-out. Extensive hands-on cleanroom fabrication experience is essential, specifically with advanced nanofabrication techniques such as Electron Beam Lithography (EBL), high-resolution photolithography
-
experience with nanofabrication processing (electron-beam lithography, maskless lithography, electron beam evaporation, dry etching, atomic layer deposition) • Background towards microsystems technology and
-
Master Thesis in Physics or Materials Science: Remanent phase shifter based on memristive technology
techniques, including pulsed laser deposition (PLD), sputter deposition, electron-beam evaporation, optical lithography, and ion-beam etching. Characterization of individual layers using atomic force
-
comprehensive training in IEMN's cleanroom facilities. The cleanroom work will rely on process modules including molecular beam epitaxy (MBE), dielectric deposition (PECVD and/or sputtering), optical lithography