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state-of-the-art lab methodology, comprising electron beam lithography (EBL), oxide sputtering, atomic force microscopy (AFM), and transport measurements. WORK-LIFE BALANCE: We offer flexible working
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the nanofabrication of microdevices (using techniques such as thin film deposition, electron-beam lithography and etching), and their electrical transport characterization. A major objective is to explore
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on artificial 2D heterostructures. It will also involve the nanofabrication of microdevices (using techniques such as thin film deposition, electron-beam lithography and etching), and their electrical
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the exfoliation and stacking of 2D materials into van der Waals heterostructures, the nanofabrication of devices (thin film deposition, electron-beam lithography, etching), and magnetotransport measurements (under
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FELLOW 7 (IF, Marseille, France): Laser damage resistance of materials and structures of pulse compressor GWS FELLOW 8 (UEF, Joensuu, Finland): Direct electron beam writing of pulse compressor GWS for high
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meta-IOLs. Explore new horizons at the interface between polymer engineering and cleanroom nanofabrication (electron-beam lithography, reactive ion etching, atomic later deposition). MPQ cleanroom in
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National Aeronautics and Space Administration (NASA) | Pasadena, California | United States | about 7 hours ago
: UV/e-beam lithography, UV imprint, Thermal/E-beam evaporation, Vapor Deposition, Reactive ion/ICP etching, dry/wet etching, Annealing, Poling, SEM, AFM, Nanophotonic design software, Comsol, Ansys
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etching, photolithography, electron beam lithography, etc, to develop and fine tune recipes and to fabricate proof of concept samples. Perform scheduled and unscheduled maintenance works on some laboratory
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spoken) – Level C1 (Common European Framework of Reference for Languages) and French (spoken) – Level B1. - Proficiency in UV lithography and electron beam lithography processes for the manufacture
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semiconductor structures, exfoliation and stacking of two-dimensional materials and fabrication of vdW heterostructures, clean-room processing (reactive ion etching, optical/electron beam lithography, scanning