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                Field
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                30 Sep 2025 Job Information Organisation/Company ETH Zürich Research Field Physics » Electromagnetism Physics » Optics Physics » Other Technology » Nanotechnology Researcher Profile Recognised 
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                the operation and upgrades of the endcap muon (EMU) system, the electromagnetic calorimeter and new MTD, and the Level-1 trigger. Current physics analysis efforts of the greater group include searches for physics 
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                technology to the market. We focus on exploiting the intrinsically high sensitivity of these platforms as, e.g., accelerometer or electromagnetic field sensor, while addressing critical practical aspects 
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                converter design for scalable design 5) Electromagnetic compatibility and filter designing in power electronics 6) Multiphysics and time-frequency modeling of electric field Proven-records in peer-reviewed 
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                25 Sep 2025 Job Information Organisation/Company KTH Royal Institute of Technology Research Field Chemistry » Physical chemistry Physics » Electromagnetism Physics » Optics Researcher Profile 
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                fields (electrical engineering, computer science, or computer engineering) Previous experience in Python programming Previous experience with electromagnetic simulation platforms Writing skills 
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                -guidance principles as well as material properties of extremely thin silica membranes. As a postdoctoral fellow in this project, you will have the opportunity to primarily carry out: electromagnetic analyses 
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                requirements include Expertise in several areas among the following is desired: radio system modeling, electromagnetics, antennas, propagation, RF frontends, radar. Demonstrated expertise in channel modeling and 
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                the theoretical and computational mechanics of shell structures, with a focus on extending these models to incorporate coupling with electromagnetic theory. This position is part of an interdisciplinary effort to 
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                ) * electromagnetic design of device using soft-ware such as comsol *clean room fabrication using both optical and e beam lithography *Optoelectronic characterization of infrared sensor (I-V, photocurrent spectrum