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to the analysis of time series. In particular, the project will examine and develop methods that go beyond the Markovian paradigm. It will consider a range of time series data, focusing on those that show
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for understanding natural magmatic processes on earth & other planetary bodies. Neutron diffraction is a powerful technique for studying the atomic scale structure of these materials, but the current technology to
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optimal operating conditions and followed by surface analysis techniques (e.g. Scanning electron microscope, X-ray diffraction for residual stress measurements, Electron Back-Scattered Diffraction and
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the conventional manufacturing process of advanced aerospace materials but also the state-of-the-art materials investigation such as scanning electron microscope (SEM), X-ray diffraction (XRD), electron backscatter
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at the Biodiscovery Institute at UoN, a multidisciplinary centre with advanced laboratory and imaging facilities Access to a full range of equipment and laboratory facilities. Inclusive and supportive lab culture with
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to produce anti-counterfeit markings, dye-free colour images, humidity and chemical sensors, anti-glare coatings and optical filters. This project will develop additive manufacturing of devices with actively
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. cell culture, molecular biology, imaging, cell signalling assays). As well as performing experiments on the project, the role will involve providing training in techniques to relevant staff/students
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Environment: Based at the Biodiscovery Institute at UoN, a multidisciplinary centre with advanced laboratory and imaging facilities Access to a full range of equipment and laboratory facilities. Inclusive and
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engineering. Expertise in numerical electrical machine design tools (Ansys, JMAG, .etc) as well as corresponding scripting skills are desirable. Experience in electrical machine prototype development would be
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engineering. Expertise in numerical tools (Ansys, JMAG, .etc) and programming are desirable. Experience in electrical machine prototype development would be advantageous. Eligibility and Application