Sort by
Refine Your Search
-
Listed
-
Category
-
Program
-
Field
-
engineered for the reporting, lineage tracing, or conditional deletion of defined dendritic cell subsets, providing powerful genetic tools for dissecting cell-specific roles in vivo. Using and optimizing
-
, Montserrat, Nicaragua, Paraguay, Peru, St. Lucia, St. Vincent and the Grenadines, Suriname and Venezuela What can be funded? Master studies in Electrical Engineering at the Universidad Nacional San Juan
-
“DiamondNanoNMR” we are looking for ambitious PhD students (75%, TV-L E13, limited to 3 years). Our mission is to apply quantum information concepts to nanoscale sensing. This emerging technology stands
-
apply? Excellently qualified academic staff of higher learning institutions and of public Kenyan research institutions in the STEM subjects (Science Technology Engineering Mathematics) and Agriculture
-
partner interactions in a laboratory context, including video-based behavior coding. Your responsibilities Developing an independent research question in the Emmy Noether Project AMOR on personality
-
environment in the fields of science, technology and administration as well as for the education of highly qualified young scientists. Laser plasma accelerators are leading a new generation of ultra-compact
-
center, CRC 1719 ChemPrint “Next-generation printed semiconductors: Atomic-level engineering via molecular surface chemistry”. Your tasks Develop new approaches for electrodeposition of metals
-
for next year’s programme. Current Note: Please note that this programme announcement is currently being updated. (22 September 2025) Who can apply? African and European Museum professionals who have at
-
dendritic cells can be associated with distinct gene expression patterns and immunological outcomes. However, current interactome analyses have so far been limited to inferred interactions based on cellular
-
nanoconstructs. The primary goal is to build an AI-based digital twin, which can predict the assortment and sequence of two-dimensional all-DNA motifs required for the engineering desired tessellation patterns