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with wet‑chemistry processing, such as III‑V wet‑etching, pre‑cleans, and surface preparation methods used in semiconductor wafer fabrication. *Basic experience supporting other wafer fabrication
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the content of their application that they meet the following screening criteria in order to be given further consideration as candidates: Education Bachelor’s degree in science (chemistry, biology
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inductively coupled plasma etch (ICP-RIE) of semiconductor materials using various chemistries. Significant and recent ** hands-on experience in design of experiments for determining process parameters
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